GD-Profiler 2 Pulsed RF Glow Discharge Spectrometer

GD-Profiler 2 Pulsed RF Glow Discharge Spectrometer

  • Ultra-Fast Depth Profiling – Achieves nanometric depth resolution with High Dynamic Detection (HDD), enabling depth profiling from the first nanometer down to 150 microns.
  • Simultaneous Multi-Element Analysis – Full spectral coverage from 110 to 800 nm for simultaneous detection of H, O, C, N, Cl, and other elements.
  • Patented Differential Interferometry Profiling (DiP) – Real-time crater depth and erosion rate measurement, providing accurate depth profiling with nanometric precision.
  • RF and Pulsed RF Operation – Pulsed RF source allows higher instantaneous power without damaging fragile or heat-sensitive samples.
  • High Sensitivity & Dynamic Range – High Dynamic Detectors (HDD) ensure superior sensitivity from sub-ppm to 100% concentration, eliminating matrix effects.
  • Advanced UFS Mode – Ultra-Fast Sputtering Mode for polymeric and organic materials without damage, speeding up surface analysis.
  • Wide Range of Applications – Ideal for thin films, multilayer coatings, semiconductors, photovoltaics, metallurgy, ceramics, and corrosion studies.
  • Intuitive Quantum Software – Powerful data processing suite with Intelligent Quantification Models, real-time measurement display, and customizable reporting tools.
  • Flexible Sample Handling – Large sample compartment accommodates odd-shaped samples with various anode diameters and accessories for complex samples.
  • No Ultra-High Vacuum Required – Operates under low pressure plasma, reducing maintenance and operational costs.

 




Description

The GD-Profiler 2 is a cutting-edge Pulsed RF Glow Discharge Optical Emission Spectrometer (GDOES) designed for fast, high-resolution elemental depth profiling of complex layered materials. Ideal for both thin and thick film characterization, the GD-Profiler 2 provides simultaneous analysis of all elements, including hydrogen, nitrogen, oxygen, and chlorine, making it indispensable for research laboratories, industrial process control, and quality assurance.

Revolutionary Depth Profiling with Pulsed RF GDOES

The GD-Profiler 2 utilizes Pulsed RF Glow Discharge technology, allowing for ultrafast elemental depth profilingwith nanometric resolution. It enables direct depth measurement using Differential Interferometry Profiling (DiP), which accurately tracks crater depth and erosion rates in real-time. The spectrometer’s simultaneous optic provides full spectral coverage from 110 to 800 nm, including deep UV access for comprehensive analysis of all elements of interest.

Applications:

The GD-Profiler 2 is ideal for:

  • Thin & Thick Film Characterization – From nanometer to hundreds of microns.
  • Multilayer Coatings – Analyze interface details, layer intermixing, and compound formation.
  • Semiconductors & LEDs – Quality control for thin film photovoltaic materials and LEDs.
  • Metallurgy & Corrosion Studies – Depth profiling of nitrides, oxides, and protective coatings.
  • Energy Materials – Elemental analysis for Li batteries, fuel cells, and solar cells.
  • Plasma Coatings (PVD/CVD) – Process control and optimization of plasma coatings.

Advanced Functionality & Usability:

  • Plasma Cleaning Function – Minimizes surface contamination for accurate surface analysis.
  • Sample Mapping Unit (SMU) – Automates multi-sample analysis for high throughput productivity.
  • Patented UFS Mode – Ensures ultra-fast sputtering without damaging polymeric layers.
  • High Dynamic Detectors (HDD) – Provide a linear dynamic acquisition range of 5×10⁹, capturing all elements from sub-ppm to 100%.

With its high speed, sensitivity, and dynamic range, the GD-Profiler 2 delivers reliable, accurate, and comprehensive elemental depth profiling for both conductive and non-conductive materials. It is the ultimate solution for advanced material research and quality control.

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