Micro-lithography Systems

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Heidelberg Instruments Heidelberg Instruments μMLA THE TABLE-TOP MASKLESS ALIGNER
- Substrate size: from 5 mm to 5”
- Minimum feature size: down to 0.6 µm
- Maximum write speed (at 4 µm resolution): 200 mm²/min
- Real-time autofocus system
- Frontside alignment
- Easy-to-use operating software
- 2 available optical setups
- Choice of exposure Module: Raster and/or Vector scan
- Variable resolution
- Draw Mode
- Wavelengths (Raster Scan): 390 nm or 365 nm exposure wavelength
- Wavelengths (Vector Scan): 405 nm and/or 375 nm
- Overview camera for alignment and inspection
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Heidelberg Instruments HEIDELBERG INSTRUMENTS MLA150 THE ADVANCED MASKLESS ALIGNER FOR R&D AND LOW-VOLUME PRODUCTION
- Minimum substrate size: 3 mm x 3 mm
- Maximum exposure area: 6” x 6” (optional 8”x 8”)
- Minimum structure size down to 0.6 μm
- Maximum write speed: 1400 mm²/min at 1 μm feature size
- Real-time autofocus
- Overview camera for fast alignment and inspection
- Front- and backside alignment
- Temperature-controlled environmental chamber
- Exposure wavelengths: 405 nm and / or 375 nm
- Draw Mode for CAD-less exposure
- Standard Grayscale Exposure Mode
- High-Aspect Ratio Mode
- Easy-to-use operating software
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Heidelberg Instruments Heidelberg Instruments MLA300 THE MASKLESS ALIGNER FOR VOLUME PRODUCTION
- Maximum exposure area: 300 mm x 300 mm
- Minimum feature size: 1.5 μm
- Minimum lines and spaces: 2 µm
- Maximum write speed: 5000 mm²/min (at 405 nm, with one module)
- Real-time autofocus
- Overview camera for fast alignment and inspection
- Front- and backside alignment
- Temperature-controlled environmental chamber
- Exposure wavelengths: 405 nm and / or 375 nm
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Heidelberg Instruments Heidelberg Instruments DWL 66+ THE ULTIMATE LITHOGRAPHY TOOL – THE SPECIALIST FOR GRAYSCALE MODE
- Maximum exposure area: 200 x 200 mm²
- Maximum substrate size: 9″ x 9″
- Multiple Write Modes
- Minimum feature size: down to 300 nm
- Maximum write speed (at 4 µm feature size): 2000 mm²/min
- Address grid down to 5 nm
- Grayscale exposure mode with up to 1000 gray levels
- Vector and Raster scan exposure mode
- Multiple data input formats
- Front- and backside alignment
- Climate chamber
- Two choices of laser wavelength (405 nm or 375 nm)
- Real-time autofocus system
- Scripting capability
- Integrated camera system for measurement and inspection
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Heidelberg Instruments Heidelberg Instruments DWL 2000/4000 HIGH RESOLUTION PATTERN GENERATORS – DIRECT 2D AND 2.5D WRITING FOR LARGE AREAS
- Maximum exposure area: up to 400 x 400 mm²
- Maximum substrate size: 17″ x 17″
- Professional Grayscale Mode
- Multiple Write Modes
- Minimum feature size down to 0.5 µm
- Maximum exposure speed (at 1.3 µm feature size): 370 mm²/ minute
- Address grid down to 5 nm
- Modular configuration concept to fit customer application
- Realtime autofocus
- Stage map correction
- Camera system for measurement and inspection
- Automatic loading system
- Customer specific laser
- Multiple data input formats (DXF, CIF, GDSII, Gerber, STL, BMP)

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Micro-lithography Systems

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