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  • Key Features

    • Generate complex materials by combining nanoparticles and thin films
    • Hydrocarbon free nanoparticles using  NL-UHV
    • UHV system with load-lock, bakeout and pumping upgrade option
    • Combination turbo/dry backing pumping
    • Confocal port geometry for up to 5 sources
    • Compatible with third party sources
    • Coating of substrates with rotation, heating and biasing options
    • Interlocks to protect both personnel and equipment
    • Fully automated and recipe driven software

     

  • Key Features

    • Generate complex materials by combining nanoparticles and thin films
    • Hydrocarbon-free nanoparticles using  NL-UHV
    • Spacious and Easy Access chamber, ideal for delicate and complex substrates
    • Upward or Downward-facing source configuration
    • Compatible with third-party sources
    • Coating of 3D objects with rotation, heating and biasing options
    • Fully automated and recipe-driven software

     

  • Key Features

    • Bakeable upto 250°C (no need to remove magnets)
    • Excellent target utilization of up to 40%
    • Standard and high-strength magnets for magnetic materials
    • Options for balanced or unbalanced magnet configurations
    • Simple bayonet clamp for straightforward target mounting
    • Includes a choice between manual or pneumatically controlled shutter
    • Available sputter target sizes: 1-inch, 2-inch, and 3-inch
    • User-friendly design with easily exchangeable magnets
    • Customizable in-vacuum length
    • Compatible with DC, RF, Pulsed DC (unipolar or bipolar), and HiPIMS power supplies

     


Showing all 3 results