Advanced microfabrication lithography for MEMS and sensors

Ultimate Laser Lithography Tool for Research & Prototyping

• High-Resolution Patterning: Minimum feature size down to 300 nm, outperforming traditional optical lithography.
• Grayscale Lithography: Supports up to 1024 gray levels for 2.5D topographies (e.g., diffractive optics, micro-optics, holograms).
• Precision Alignment:
  • Frontside Alignment Accuracy: 250 nm
  • Backside Alignment Accuracy (Optional): 1000 nm
  • 2nd Layer Overlay Accuracy: 350 nm (with High-Accuracy Option)
• Versatile Substrate Compatibility: Supports substrates from 5 mm to 230 mm, with thickness up to 12 mm.
• Flexible Laser Options: Choose between 405 nm (broadband resists) and 375 nm (SU-8 & i-line resists).
• Automated Loading System (Optional): Enables high-precision wafer handling, supporting masks up to 7” and wafers up to 8”.