Grayscale Lithography

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Heidelberg Instruments Heidelberg DWL 2000 GS / DWL 4000 GS
High-Precision Grayscale Lithography Systems for Micro-Optics & More
- Minimum Feature Size: 500 nm
- Write Modes: Five options with variable write speeds and resolutions
- Max Substrate Size: DWL 2000 GS: 200 x 200 mm², DWL 4000 GS: 400 x 400 mm²
- Exposure Speed: Up to 1000 mm²/min in grayscale mode
- Automation Ready: Loading system, carrier station, pre-aligner & scanner options available
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Heidelberg Instruments Heidelberg DWL 66+ High-Resolution Laser Lithography
Ultimate Laser Lithography Tool for Research & Prototyping
- High-Resolution Patterning: Minimum feature size down to 300 nm, outperforming traditional optical lithography.
- Grayscale Lithography: Supports up to 1024 gray levels for 2.5D topographies (e.g., diffractive optics, micro-optics, holograms).
- Precision Alignment:
  
  Frontside Alignment Accuracy: 250 nm
  
  Backside Alignment Accuracy (Optional): 1000 nm
  
  2nd Layer Overlay Accuracy: 350 nm (with High-Accuracy Option)
- Versatile Substrate Compatibility: Supports substrates from 5 mm to 230 mm, with thickness up to 12 mm.
- Flexible Laser Options: Choose between 405 nm (broadband resists) and 375 nm (SU-8 & i-line resists).
- Automated Loading System (Optional): Enables high-precision wafer handling, supporting masks up to 7” and wafers up to 8”.

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