Microfluidics Research

Compact Maskless Lithography System for High-Precision Microstructuring

• High-Resolution Maskless Lithography: No mask required—direct-write exposure ensures efficient and cost-effective fabrication.
• Flexible Exposure Modes:
  • Raster Scan Mode: Consistent high-speed writing regardless of pattern density.
  • Vector Scan Mode: Ideal for curved structures, delivering smooth, continuous lines.
• Compact & Small Footprint: 25″ x 33″ x 21″ (640 mm x 840 mm x 530 mm) – fits on a standard lab workbench.
• Fast Exposure Speeds: A 4″ wafer can be exposed in just 90 minutes.
• Advanced Optical Configurations: Min. resolution of 0.6 µm, 1 µm, and 3 µm, with variable resolution options.
• High-Precision Alignment:
  • Edge roughness: Raster mode: 100 nm, Vector mode: 30 nm
  • CD uniformity: 200 nm
• Upgradable Exposure Area: Expand from 100 x 100 mm² to 150 x 150 mm².
• Glovebox Integration: Compatible for patterning sensitive materials in controlled environments.