Heidelberg DWL 66+ High-Resolution Laser Lithography

High-Resolution Maskless Direct Imager for R&D & Prototyping

• Maskless Direct Imaging: Write high-resolution microstructures in i-line resists without requiring photomasks.
• Ultra-High-Speed Exposure: 100 x 100 mm² exposure in just 9 minutes.
• Exceptional Resolution & Accuracy:
  • Minimum feature size: 500 nm
  • Edge roughness: < 40 nm
  • CD uniformity: < 60 nm
  • Alignment accuracy: Topside: 100 nm | Backside VIS/IR: ±1 µm
• Advanced Calibration & Autofocus:
  • Real-time optical & pneumatic autofocus with 80 µm dynamic compensation.
  • Integrated metrology functions for positioning, CD uniformity, and edge roughness monitoring.
• Multi-Mode Write System: Choose from two write modes:
  • High NA Mode: Maximum resolution for ultra-fine microstructures.
  • Lower NA Mode: Optimized for throughput and depth-of-focus (DOF) critical applications.
• Scalable & Flexible:
  • Maximum exposure area: 300 x 300 mm².
  • Compatible with wafers up to 300 mm in size.

NEBULA Plasma Treatment Systems offer a revolution in surface activation and coatings. Designed for both industrial processing and research, NEBULA systems come in chamber sizes from 30L to 150L and offer various tray configurations. Key features include plasma polymerization, PLC control, and user-friendly recipe-driven operations. The systems are compact, eco-friendly with no hazardous emissions, and provide fast, precise, and repeatable treatments. The unique liquid dosing inlet further extends the range of plasma surface treatment possibilities. NEBULA is suitable for applications like cleaning, adhesion improvement, and nano-scale coatings on metals, polymers, composites, ceramics, and glass. It’s a versatile and safe solution that’s compatible with a wide range of materials, offering unparalleled precision, user-friendliness, and sustainability in the field of plasma treatment. Experience the future of plasma technology with NEBULA systems.

High-Precision Grayscale Lithography Systems for Micro-Optics & More

• Minimum Feature Size: 500 nm
• Write Modes: Five options with variable write speeds and resolutions
• Max Substrate Size: DWL 2000 GS: 200 x 200 mm², DWL 4000 GS: 400 x 400 mm²
• Exposure Speed: Up to 1000 mm²/min in grayscale mode
• Automation Ready: Loading system, carrier station, pre-aligner & scanner options available

• Nikalyte NL50 benchtop system enables the deposition of ultra-pure metallic nanoparticles in research laboratories.
• It’s designed to be user-friendly and convenient, allowing for easy and repeatable deposition of non-agglomerated nanoparticles on samples up to 50mm in diameter.
• The deposition process is operated through a touchscreen interface, making it simple to use. Training for routine operations can be completed in as little as 10 minutes.
• NL50 allows for the modification of process variables, including nanoparticle size, distribution, and layer thickness.
• Samples can be loaded through a clear chamber door and can undergo plasma cleaning before deposition.
• Changing the source materials can be done quickly, within 5 minutes.
• The vacuum deposition process ensures the production of ultra-pure nanoparticles without hydrocarbons or other contaminants commonly found in chemical techniques.
• The nanoparticle coating is directly deposited onto the substrate, and after a typical cycle time of 30 minutes, it is ready for analysis without the need for additional drying or purification steps.