NEXUS- Nanoparticle & Thin film UHV Deposition System

NEXUS- Nanoparticle & Thin film UHV Deposition System

Key Features

  • Generate complex materials by combining nanoparticles and thin films
  • Hydrocarbon free nanoparticles using  NL-UHV
  • UHV system with load-lock, bakeout and pumping upgrade option
  • Combination turbo/dry backing pumping
  • Confocal port geometry for up to 5 sources
  • Compatible with third party sources
  • Coating of substrates with rotation, heating and biasing options
  • Interlocks to protect both personnel and equipment
  • Fully automated and recipe driven software

 

SKU: NEXUSUHVDEPO Category:



Description

The NEXUS is an ultra high vacuum PVD System capable of generating both nanoparticles and thin films that is well-suited for both industry and academic research. Serving a wide range of applications including catalysis, photonics, energy storage, sensors, and life sciences. This UHV deposition system can be integrated with analytical tools to provide a fully customized solution for your research needs.

System Configuration for NEXUS UHV Deposition System:

NEXUS UHV Deposition System

 

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