Heidelberg Instruments

The MPO 100 is a Two-Photon Polymerization (TPP) multi-user tool for 3D Lithography and Micro-Printing of microstructures with applications in Optics, Photonics, Mechanics, and Biomedical Engineering. The modular 3D printing platform MPO 100 offers high precision on demand for 3D Lithography as well as high print volume for 3D Microprinting and enables the production of complex functional microstructures with high throughput in a single process step.

• Substrate size: from 5 mm to 5”
• Minimum feature size: down to 0.6 µm
• Maximum write speed (at 4 µm resolution): 200 mm²/min
• Real-time autofocus system
• Frontside alignment
• Easy-to-use operating software
• 2 available optical setups
• Choice of exposure Module: Raster and/or Vector scan
• Variable resolution
• Draw Mode
• Wavelengths (Raster Scan): 390 nm or 365 nm exposure wavelength
• Wavelengths (Vector Scan): 405 nm and/or 375 nm
• Overview camera for alignment and inspection

• Minimum substrate size: 3 mm x 3 mm
• Maximum exposure area: 6” x 6” (optional 8”x 8”)
• Minimum structure size down to 0.6 μm
• Maximum write speed: 1400 mm²/min at 1 μm feature size
• Real-time autofocus
• Overview camera for fast alignment and inspection
• Front- and backside alignment
• Temperature-controlled environmental chamber
• Exposure wavelengths: 405 nm and / or 375 nm
• Draw Mode for CAD-less exposure
• Standard Grayscale Exposure Mode
• High-Aspect Ratio Mode
• Easy-to-use operating software

• Maximum exposure area: 300 mm x 300 mm
• Minimum feature size: 1.5 μm
• Minimum lines and spaces: 2 µm
• Maximum write speed: 5000 mm²/min (at 405 nm, with one module)
• Real-time autofocus
• Overview camera for fast alignment and inspection
• Front- and backside alignment
• Temperature-controlled environmental chamber
• Exposure wavelengths: 405 nm and / or 375 nm

• Maximum exposure area: 200 x 200 mm²
• Maximum substrate size: 9″ x 9″
• Multiple Write Modes
• Minimum feature size: down to 300 nm
• Maximum write speed (at 4 µm feature size): 2000 mm²/min
• Address grid down to 5 nm
• Grayscale exposure mode with up to 1000 gray levels
• Vector and Raster scan exposure mode
• Multiple data input formats
• Front- and backside alignment
• Climate chamber
• Two choices of laser wavelength (405 nm or 375 nm)
• Real-time autofocus system
• Scripting capability
• Integrated camera system for measurement and inspection

• Maximum exposure area: up to 400 x 400 mm²
• Maximum substrate size: 17″ x 17″
• Professional Grayscale Mode
• Multiple Write Modes
• Minimum feature size down to 0.5 µm
• Maximum exposure speed (at 1.3 µm feature size): 370 mm²/ minute
• Address grid down to 5 nm
• Modular configuration concept to fit customer application
• Realtime autofocus
• Stage map correction
• Camera system for measurement and inspection
• Automatic loading system
• Customer specific laser
• Multiple data input formats (DXF, CIF, GDSII, Gerber, STL, BMP)

TABLETOP DIRECT WRITE NANOLITHOGRAPHY & AFM

• Detection of features buried under resist.
• Fast exchange and calibration
• Integrated topography sensor
• Entry-level nanopatterning system with many unique capabilities
• Thermal probe lithography is the fastest of all scanning probe lithography methods
• Direct resist removal and in-situ inspection enable fast turnaround times.
• Well-suited for academic research groups as a simple tool to easily create their own high-quality nanopatterns and devices

Revolutionizing Nanofabrication

INDUSTRIAL-GRADE THERMAL SCANNING PROBE LITHOGRAPHY TOOL WITH MULTI-TIP WRITE HEAD

• High-resolution
• Thermal Scanning Probe Lithography
• Non-invasive Lithography
• Precise Overlay and Stitching
• Unique Thermal Cantilevers
• IDecapede Module
• Laser Sublimation Module
• Vibration Isolation
• Low Cost of Ownership
• Compatibility with all standard pattern transfer methods: lift-off, etching, nanoimprint lithography
• In-situ Imaging immediate control of patterned structures

Lithography systems can accommodate substrates of arbitrary shapes with lateral dimensions of up to 1400 x 1400 mm²